Firstly, ultrapure water is used in semiconductor manufacturing processes for wafer rinsing, chemical dilution, chemical mechanical polishing, and humidification sources in clean room environments. The quality of ultrapure water is directly related to the yield of semiconductors. With the reduction of semiconductor component size and the improvement of fineness, the technical requirements for the quality of ultrapure water are constantly increasing. Any slight difference in particle size, resistivity, and TOC compared to the indicators in bubbles may lead to a decrease in the qualification rate of semiconductor component production.
Secondly, the semiconductor industry has a high demand for water resources and has extremely high requirements for water quality. With the improvement of chip manufacturing processes, the number of cleaning steps also increases accordingly, and the water consumption will increase exponentially. Therefore, semiconductor companies need to improve water resource utilization efficiency and solve water resource competition problems through technological innovation and cooperation with high-quality suppliers. Many semiconductor companies actively seek cooperation with ultra pure water companies that have advanced recycling solutions to innovate green water systems, in order to improve water resource utilization, reduce operating costs, and ensure water resource security.
Finally, the performance indicators of ultrapure water equipment include water purity, water flow rate, water quality stability, and equipment maintenance, all of which are important factors in ensuring the smooth progress of semiconductor production processes. The performance of the equipment directly affects the quality of ultrapure water, which in turn affects the production efficiency and yield of semiconductors.
In summary, the semiconductor industry does require the use of ultrapure water equipment in the production process to ensure smooth production and stable product quality.